Schoon ontwerpen, produceren, assembleren en verpakken

Elvis Bajric, Eventmanager Clean 2020, Mikrocentrum

Philip van Beek, Voorzitter, VCCN

Dirk Trienekens, Cleanliness Expert, ASML

Cleanliness is becoming ever more important for ASML. Particles as small as 30 nm can cause defects for our customers, and trace amounts of certain elements can have a devastating effect on the optics. To secure performance of our systems in terms of defectivity and optics lifetime, we must be more stringent when it comes to cleanliness. To facilitate this, a new set of cleanliness requirements for suppliers was required: the new cleanliness GSA (Generic Standard of ASML) framework. While creating these GSAs, we also focused on creating more awareness for the importance of cleanliness, a clearer document structure and reducing the amount of text. In this presentation, we will present the new GSAs and the new way of working associated with it. We also briefly zoom in on the approach for the most critical (grade 1) parts, where simply performing a cleaning action after manufacturing will not suffice anymore. In the new approach for grade 1 parts, suppliers and ASML work together to pro-actively determine and eliminate risks with respect to contamination in the production process.

Freek Molkenboer, Systems Engineer, TNO

Er zijn vele werkgebieden waar moleculaire vervuiling van een oppervlak een probleem is voor het goed functioneren van een systeem. Het is van belang om tijdens het ontwerpstadium van een product of een systeem, de oppervlaktereinheidseisen realistisch op te stellen. Dit om te voorkomen dat het product óf niet schoon genoeg is óf dat er overbodige reinigingskosten worden gemaakt. In de presentatie zal een praktijkvoorbeeld worden gebruikt om alle aspecten van schoon produceren te tonen; van het opzetten van een vervuilingsbudget tot het valideren van het eindproduct.

Christian Schelle, Cleaning specialist Switzerland, VAT Vakuumventile AG

The demand for precision cleaned semiconductor components has been growing fast in the past 5 years. Furthermore, allowed particle emission of vacuum valves had to be reduced strongly to comply with requirement of sub 10 nm and introduction of EUV technology. Due to our strong focus on the semiconductor markets VAT has invested heavily into efficient precision cleaning technology as well a vacuum particle lab, which is unique for a component supplier. VAT has realized early that to fabricate and deliver a clean part, the complete manufacturing process and supply chain has to be understood and monitored. Automation and in-line process control are key elements to deliver a continuous quality to our customers. In our presentation, we will give you insights in VAT High Purity and Zero Particle program. We will explain the importance of the selection of materials, machining and cleaning equipment, packaging, automation and process control.

RVS Finish, Ecoclean, Mavom

RVS Finish heeft gekozen voor dampfasereiniging om te voldoen aan de strenge reinheidseisen. Wat was de motivatie om met dit project te starten? Waarom hebben ze voor dampfasereiniging gekozen en wat zijn de uitdagingen geweest?  Met de aanschaf van een machine ben je er niet. Het gehele proces moet onder controle zijn. De techniek achter dampfasereiniging zal worden verteld door Ecoclean. Mavom (Savechem) levert de gemodificeerde alcohol voor in de machine. Wat zijn de do’s and don’ts? Hoe kom je tot een perfect gereinigd product?

Omneo

Alex Jansen, Algemeen Directeur, Interflow
Kees de Wit, Principal Architect Clean Technology, ASML

Een cleanroom wordt meestal gebouwd als vaste inrichting in een gebouw. Maar wat als in de loop van de tijd de capaciteit moet meegroeien, als je moet verhuizen, de kwalificatie van de cleanroom hoger moet, of de conditionering van de lucht moet worden aangepast?
Het flex cleanroom concept geeft antwoorden op deze vragen. In een presentatie van Interflow samen met ASML krijgt u uitleg over het concept en inzicht in de manier waarop ASML flexibiliteit creëert en een nog betere inzet van kapitaal.

Mart Stokmans, Directeur , Labo Mechanische Bewerkingen
Hans Cools, Manager Operations, Innovar
Henry van Haeff, Directeur, 2-S

Labo is ISO 9001 gecertificeerd. Procedures en afhandeling zijn vastgelegd en de productieomgeving (van productieruimte tot meetkamer) is geklimatiseerd. Productie vindt plaats in een constante temperatuur en schone lucht. Zij leveren zowel enkelstuks als seriematige productie. 

Hoe hebben zij schoon produceren aangepakt in hun productieomgeving?

In een forum-gesprek met Mart Stokmans (LABO), Hans Cools (Innovar) en Henry van Haeff (2-S) wordt het proces ontrafelt.

Robert Meier, Head of Cleaning Process Technology, ZEISS Semiconductor Manufacturing Technology

In the context of manufacturing complex optics for semiconductor lithography systems great importance is attached to highly specialized EUV cleaning processes including the installation of specific machinery and specialized cleanliness processes. A key function for the successful realization was ascribed to standardization of the related processes and metrology procedures throughout the complete supply chain. This presentation puts is focus on organic contamination and the presence of critical elements on atomic level and their influence on optical lifetime in the EUV systems. The jointly taken effort of ASML and CZ SMT covers the alignment of guidelines which should reach down to the n-th tier of the supply chain, over the common release of international positioned cleanliness service providers.

Elvis Bajric, Eventmanager Clean 2020, Mikrocentrum

Philip van Beek, Voorzitter, VCCN

Dirk Trienekens, Cleanliness Expert, ASML

Cleanliness is becoming ever more important for ASML. Particles as small as 30 nm can cause defects for our customers, and trace amounts of certain elements can have a devastating effect on the optics. To secure performance of our systems in terms of defectivity and optics lifetime, we must be more stringent when it comes to cleanliness. To facilitate this, a new set of cleanliness requirements for suppliers was required: the new cleanliness GSA (Generic Standard of ASML) framework. While creating these GSAs, we also focused on creating more awareness for the importance of cleanliness, a clearer document structure and reducing the amount of text. In this presentation, we will present the new GSAs and the new way of working associated with it. We also briefly zoom in on the approach for the most critical (grade 1) parts, where simply performing a cleaning action after manufacturing will not suffice anymore. In the new approach for grade 1 parts, suppliers and ASML work together to pro-actively determine and eliminate risks with respect to contamination in the production process.

Freek Molkenboer, Systems Engineer, TNO

Er zijn vele werkgebieden waar moleculaire vervuiling van een oppervlak een probleem is voor het goed functioneren van een systeem. Het is van belang om tijdens het ontwerpstadium van een product of een systeem, de oppervlaktereinheidseisen realistisch op te stellen. Dit om te voorkomen dat het product óf niet schoon genoeg is óf dat er overbodige reinigingskosten worden gemaakt. In de presentatie zal een praktijkvoorbeeld worden gebruikt om alle aspecten van schoon produceren te tonen; van het opzetten van een vervuilingsbudget tot het valideren van het eindproduct.

Christian Schelle, Cleaning specialist Switzerland, VAT Vakuumventile AG

The demand for precision cleaned semiconductor components has been growing fast in the past 5 years. Furthermore, allowed particle emission of vacuum valves had to be reduced strongly to comply with requirement of sub 10 nm and introduction of EUV technology. Due to our strong focus on the semiconductor markets VAT has invested heavily into efficient precision cleaning technology as well a vacuum particle lab, which is unique for a component supplier. VAT has realized early that to fabricate and deliver a clean part, the complete manufacturing process and supply chain has to be understood and monitored. Automation and in-line process control are key elements to deliver a continuous quality to our customers. In our presentation, we will give you insights in VAT High Purity and Zero Particle program. We will explain the importance of the selection of materials, machining and cleaning equipment, packaging, automation and process control.

RVS Finish, Ecoclean, Mavom

RVS Finish heeft gekozen voor dampfasereiniging om te voldoen aan de strenge reinheidseisen. Wat was de motivatie om met dit project te starten? Waarom hebben ze voor dampfasereiniging gekozen en wat zijn de uitdagingen geweest?  Met de aanschaf van een machine ben je er niet. Het gehele proces moet onder controle zijn. De techniek achter dampfasereiniging zal worden verteld door Ecoclean. Mavom (Savechem) levert de gemodificeerde alcohol voor in de machine. Wat zijn de do’s and don’ts? Hoe kom je tot een perfect gereinigd product?

Peter Buescher, Application Specialist, Olympus Nederland

Enhancing component and surface cleaning tasks across all sectors like: Electronics, Aerospace, Automotive and special for his event semiconductor industry.
We will show you how to measure partical contamination of component surface. And why it is important to detect particals.
An innovative illumination system enables the fast separation of metallic and non-matallic particles in cleanliness inspection.
The complete workflow from particle extraction to their detection, enumeration and classification is described based on industry standards.

Luigi Raspolini, Application and Product Specialist Electron Microscopy, Thermo Fisher Scientific

Particulate in the production environment poses a threat to mass production. Scanning electron microscopes (SEM) with energy dispersive spectrometers (EDS) are valuable and widely recognized tools that can effectively determine the presence of contaminants and reveal their chemical composition. The analysis - normally manually operated - is performed on every single particle, resulting in a long and tedious process with high chance of error, typically resulting in outsourcing of the analysis to a specialized and expensive center. Phenom ParticleX is an automated imaging and analysis workflow, cherry-topped by an advanced classification system that will recognize the particle material directly from its chemical composition in just half a second per particle – thus allowing for a timely intervention on the production line as soon as threats are identified.

Paul Krüsemann, Specialist contamination control, Eurofins Materials Science Netherlands

The effect of particles on products and production resources has been known for a long time. It is for that reason why production and assembly are performed in a clean room. Care is taken into preventive cleaning of basic materials and tools, and research is being conducted into applied materials to prevent the generation of particles during various process steps. However, the presence of gases and vapours (Airborne Molecular Contamination, AMC) can also have a disastrous effect on products and machines with similar negative phenomena as with particle contamination. For this reason, the control of chemical contaminants in clean room air and release by outgassing of materials is crucial for successful production. The effects have been recognized for a long time in the semi-conductor industry and much effort is required to keep this potential contamination source to a minimum.

Robert Meier, Head of Cleaning Process Technology, ZEISS Semiconductor Manufacturing Technology

In the context of manufacturing complex optics for semiconductor lithography systems great importance is attached to highly specialized EUV cleaning processes including the installation of specific machinery and specialized cleanliness processes. A key function for the successful realization was ascribed to standardization of the related processes and metrology procedures throughout the complete supply chain. This presentation puts is focus on organic contamination and the presence of critical elements on atomic level and their influence on optical lifetime in the EUV systems. The jointly taken effort of ASML and CZ SMT covers the alignment of guidelines which should reach down to the n-th tier of the supply chain, over the common release of international positioned cleanliness service providers.

Elvis Bajric, Eventmanager Clean 2020, Mikrocentrum

Philip van Beek, Voorzitter, VCCN

Dirk Trienekens, Cleanliness Expert, ASML

Cleanliness is becoming ever more important for ASML. Particles as small as 30 nm can cause defects for our customers, and trace amounts of certain elements can have a devastating effect on the optics. To secure performance of our systems in terms of defectivity and optics lifetime, we must be more stringent when it comes to cleanliness. To facilitate this, a new set of cleanliness requirements for suppliers was required: the new cleanliness GSA (Generic Standard of ASML) framework. While creating these GSAs, we also focused on creating more awareness for the importance of cleanliness, a clearer document structure and reducing the amount of text. In this presentation, we will present the new GSAs and the new way of working associated with it. We also briefly zoom in on the approach for the most critical (grade 1) parts, where simply performing a cleaning action after manufacturing will not suffice anymore. In the new approach for grade 1 parts, suppliers and ASML work together to pro-actively determine and eliminate risks with respect to contamination in the production process.

Freek Molkenboer, Systems Engineer, TNO

Er zijn vele werkgebieden waar moleculaire vervuiling van een oppervlak een probleem is voor het goed functioneren van een systeem. Het is van belang om tijdens het ontwerpstadium van een product of een systeem, de oppervlaktereinheidseisen realistisch op te stellen. Dit om te voorkomen dat het product óf niet schoon genoeg is óf dat er overbodige reinigingskosten worden gemaakt. In de presentatie zal een praktijkvoorbeeld worden gebruikt om alle aspecten van schoon produceren te tonen; van het opzetten van een vervuilingsbudget tot het valideren van het eindproduct.

Christian Schelle, Cleaning specialist Switzerland, VAT Vakuumventile AG

The demand for precision cleaned semiconductor components has been growing fast in the past 5 years. Furthermore, allowed particle emission of vacuum valves had to be reduced strongly to comply with requirement of sub 10 nm and introduction of EUV technology. Due to our strong focus on the semiconductor markets VAT has invested heavily into efficient precision cleaning technology as well a vacuum particle lab, which is unique for a component supplier. VAT has realized early that to fabricate and deliver a clean part, the complete manufacturing process and supply chain has to be understood and monitored. Automation and in-line process control are key elements to deliver a continuous quality to our customers. In our presentation, we will give you insights in VAT High Purity and Zero Particle program. We will explain the importance of the selection of materials, machining and cleaning equipment, packaging, automation and process control.

RVS Finish, Ecoclean, Mavom

RVS Finish heeft gekozen voor dampfasereiniging om te voldoen aan de strenge reinheidseisen. Wat was de motivatie om met dit project te starten? Waarom hebben ze voor dampfasereiniging gekozen en wat zijn de uitdagingen geweest?  Met de aanschaf van een machine ben je er niet. Het gehele proces moet onder controle zijn. De techniek achter dampfasereiniging zal worden verteld door Ecoclean. Mavom (Savechem) levert de gemodificeerde alcohol voor in de machine. Wat zijn de do’s and don’ts? Hoe kom je tot een perfect gereinigd product?

Michael Flämmich, Vice President, , VACOM Vakkuum Komponenten & Messtechnik GmbH

VACOM operates various ultra-fine cleaning processes for in-house manufactured parts as well as for Cleaning Service parts (ex-house manufactured parts) for more than 10 years. With cleaning technologies in clean rooms ISO7 to ISO5 we serve some of the most demanding Supplier Networks (e.g. in EUV-Lithography) with precisely manufactured components and Parts Cleaning Services according to the highest cleanliness specifications.
The talk covers the process to provide ultra-fine cleaned parts from the perspective of a parts manufacturer as well as from the perspective of a Cleaning Service Provider. Some challenges and well-proven solutions will be contemplated. An outlook will be given on the new Parts Cleaning Infrastructure "Clean Fab".

Gerhard Koblenzer, Managing Director, LPW Reinigungssysteme

LPW`s High Purity Division is a desirable partner in sectors with challenging cleaning specifications in Medical, Optical, and Semiconductor Industries. LPW provides standard as well as customized solutions, optimizing customers production processes.

We are especially focused on energy efficiency, uptime, and yield improvement on tool availability and quality terms. We combine established cleaning and drying methods with new state of the art methods, and develop solutions to outperform customers process requirements. Therefore LPW is able to set the benchmark for the currently relevant undesired impurities (particulate, organic or biological).

Our hermetically sealed process chambers, which facilitates the exclusion of interfering environmental factors, are key for the above mentioned performance. Applying and combining physical factors, such as pressure, vacuum, spray technology, and flow dynamics are opening a multitude process of window, optimizing or increasing our total performance. Smart process engineering, in conjunction with the customers expertise, reflects the principal element of our continuous R&D work

In recent years, LPW has been able to demonstrate its system systems to several ASML suppliers. The LPW team was able to demonstrate its skills, particularly in the case of complex geometries, densely packed and varied goods and the highest demands on technical cleanliness.

In the presentation, LPW presents the challenge and the suitable solutions for precision cleaning directly on the boundary layer and illustrates this using suitable examples.

Hein Verschuuren, Unicorn industrial cleaning solutions

Hein Verschuuren, Managing Director, Unicorn industrial cleaning solutions

Robert Meier, Head of Cleaning Process Technology, ZEISS Semiconductor Manufacturing Technology

In the context of manufacturing complex optics for semiconductor lithography systems great importance is attached to highly specialized EUV cleaning processes including the installation of specific machinery and specialized cleanliness processes. A key function for the successful realization was ascribed to standardization of the related processes and metrology procedures throughout the complete supply chain. This presentation puts is focus on organic contamination and the presence of critical elements on atomic level and their influence on optical lifetime in the EUV systems. The jointly taken effort of ASML and CZ SMT covers the alignment of guidelines which should reach down to the n-th tier of the supply chain, over the common release of international positioned cleanliness service providers.