Schoon ontwerpen, produceren, assembleren en verpakken

Elvis Bajric, Eventmanager Clean 2020, Mikrocentrum

Philip van Beek, Voorzitter, VCCN

Dirk Trienekens, Cleanliness Expert, ASML

Cleanliness is becoming ever more important for ASML. Particles as small as 30 nm can cause defects for our customers, and trace amounts of certain elements can have a devastating effect on the optics. To secure performance of our systems in terms of defectivity and optics lifetime, we must be more stringent when it comes to cleanliness. To facilitate this, a new set of cleanliness requirements for suppliers was required: the new cleanliness GSA (Generic Standard of ASML) framework. While creating these GSAs, we also focused on creating more awareness for the importance of cleanliness, a clearer document structure and reducing the amount of text. In this presentation, we will present the new GSAs and the new way of working associated with it. We also briefly zoom in on the approach for the most critical (grade 1) parts, where simply performing a cleaning action after manufacturing will not suffice anymore. In the new approach for grade 1 parts, suppliers and ASML work together to pro-actively determine and eliminate risks with respect to contamination in the production process.

Freek Molkenboer, Systems Engineer, TNO

Er zijn vele werkgebieden waar moleculaire vervuiling van een oppervlak een probleem is voor het goed functioneren van een systeem. Het is van belang om tijdens het ontwerpstadium van een product of een systeem, de oppervlaktereinheidseisen realistisch op te stellen. Dit om te voorkomen dat het product óf niet schoon genoeg is óf dat er overbodige reinigingskosten worden gemaakt. In de presentatie zal een praktijkvoorbeeld worden gebruikt om alle aspecten van schoon produceren te tonen; van het opzetten van een vervuilingsbudget tot het valideren van het eindproduct.

Christian Schelle, Cleaning specialist Switzerland, VAT Vakuumventile AG

The demand for precision cleaned semiconductor components has been growing fast in the past 5 years. Furthermore, allowed particle emission of vacuum valves had to be reduced strongly to comply with requirement of sub 10 nm and introduction of EUV technology. Due to our strong focus on the semiconductor markets VAT has invested heavily into efficient precision cleaning technology as well a vacuum particle lab, which is unique for a component supplier. VAT has realized early that to fabricate and deliver a clean part, the complete manufacturing process and supply chain has to be understood and monitored. Automation and in-line process control are key elements to deliver a continuous quality to our customers. In our presentation, we will give you insights in VAT High Purity and Zero Particle program. We will explain the importance of the selection of materials, machining and cleaning equipment, packaging, automation and process control.

RVS Finish, Ecoclean, Mavom

RVS Finish heeft gekozen voor dampfasereiniging om te voldoen aan de strenge reinheidseisen. Wat was de motivatie om met dit project te starten? Waarom hebben ze voor dampfasereiniging gekozen en wat zijn de uitdagingen geweest?  Met de aanschaf van een machine ben je er niet. Het gehele proces moet onder controle zijn. De techniek achter dampfasereiniging zal worden verteld door Ecoclean. Mavom (Savechem) levert de gemodificeerde alcohol voor in de machine. Wat zijn de do’s and don’ts? Hoe kom je tot een perfect gereinigd product?

Cees van Duyn, Omneo

In de regio wordt moleculaire contaminatie gemeten met Restgas Analyse systemen (RGA).

Deze analyse wordt vooral toegepast op eindproducten. Uitval van eindproducten op deze specificatie zorgt voor vervelende verstoringen in de toeleverketen. Om de producten First Time Right te kunnen produceren moet de toeleverketen betrouwbaar schone producten kunnen leveren.

Er wordt uitgelegd hoe de processen in de toeleverketen op een praktische manier kunnen worden gecontroleerd en welke middelen daarvoor nodig zijn. 

Alex Jansen, Algemeen Directeur, Interflow
Kees de Wit, Principal Architect Clean Technology, ASML

Een cleanroom wordt meestal gebouwd als vaste inrichting in een gebouw. Maar wat als in de loop van de tijd de capaciteit moet meegroeien, als je moet verhuizen, de kwalificatie van de cleanroom hoger moet, of de conditionering van de lucht moet worden aangepast?
Het flex cleanroom concept geeft antwoorden op deze vragen. In een presentatie van Interflow samen met ASML krijgt u uitleg over het concept en inzicht in de manier waarop ASML flexibiliteit creëert en een nog betere inzet van kapitaal.

Mart Stokmans, Directeur , Labo Mechanische Bewerkingen
Hans Cools, Manager Operations, Innovar
Henry van Haeff, Directeur, 2-S

Labo is ISO 9001 gecertificeerd. Procedures en afhandeling zijn vastgelegd en de productieomgeving (van productieruimte tot meetkamer) is geklimatiseerd. Productie vindt plaats in een constante temperatuur en schone lucht. Zij leveren zowel enkelstuks als seriematige productie. 

Hoe hebben zij schoon produceren aangepakt in hun productieomgeving?

In een forum-gesprek met Mart Stokmans (LABO), Hans Cools (Innovar) en Henry van Haeff (2-S) wordt het proces ontrafelt.

Robert Meier, Head of Cleaning Process Technology, ZEISS Semiconductor Manufacturing Technology

In the context of manufacturing complex optics for semiconductor lithography systems great importance is attached to highly specialized EUV cleaning processes including the installation of specific machinery and specialized cleanliness processes. A key function for the successful realization was ascribed to standardization of the related processes and metrology procedures throughout the complete supply chain. This presentation puts is focus on organic contamination and the presence of critical elements on atomic level and their influence on optical lifetime in the EUV systems. The jointly taken effort of ASML and CZ SMT covers the alignment of guidelines which should reach down to the n-th tier of the supply chain, over the common release of international positioned cleanliness service providers.

Elvis Bajric, Eventmanager Clean 2020, Mikrocentrum

Philip van Beek, Voorzitter, VCCN

Dirk Trienekens, Cleanliness Expert, ASML

Cleanliness is becoming ever more important for ASML. Particles as small as 30 nm can cause defects for our customers, and trace amounts of certain elements can have a devastating effect on the optics. To secure performance of our systems in terms of defectivity and optics lifetime, we must be more stringent when it comes to cleanliness. To facilitate this, a new set of cleanliness requirements for suppliers was required: the new cleanliness GSA (Generic Standard of ASML) framework. While creating these GSAs, we also focused on creating more awareness for the importance of cleanliness, a clearer document structure and reducing the amount of text. In this presentation, we will present the new GSAs and the new way of working associated with it. We also briefly zoom in on the approach for the most critical (grade 1) parts, where simply performing a cleaning action after manufacturing will not suffice anymore. In the new approach for grade 1 parts, suppliers and ASML work together to pro-actively determine and eliminate risks with respect to contamination in the production process.

Freek Molkenboer, Systems Engineer, TNO

Er zijn vele werkgebieden waar moleculaire vervuiling van een oppervlak een probleem is voor het goed functioneren van een systeem. Het is van belang om tijdens het ontwerpstadium van een product of een systeem, de oppervlaktereinheidseisen realistisch op te stellen. Dit om te voorkomen dat het product óf niet schoon genoeg is óf dat er overbodige reinigingskosten worden gemaakt. In de presentatie zal een praktijkvoorbeeld worden gebruikt om alle aspecten van schoon produceren te tonen; van het opzetten van een vervuilingsbudget tot het valideren van het eindproduct.

Christian Schelle, Cleaning specialist Switzerland, VAT Vakuumventile AG

The demand for precision cleaned semiconductor components has been growing fast in the past 5 years. Furthermore, allowed particle emission of vacuum valves had to be reduced strongly to comply with requirement of sub 10 nm and introduction of EUV technology. Due to our strong focus on the semiconductor markets VAT has invested heavily into efficient precision cleaning technology as well a vacuum particle lab, which is unique for a component supplier. VAT has realized early that to fabricate and deliver a clean part, the complete manufacturing process and supply chain has to be understood and monitored. Automation and in-line process control are key elements to deliver a continuous quality to our customers. In our presentation, we will give you insights in VAT High Purity and Zero Particle program. We will explain the importance of the selection of materials, machining and cleaning equipment, packaging, automation and process control.

RVS Finish, Ecoclean, Mavom

RVS Finish heeft gekozen voor dampfasereiniging om te voldoen aan de strenge reinheidseisen. Wat was de motivatie om met dit project te starten? Waarom hebben ze voor dampfasereiniging gekozen en wat zijn de uitdagingen geweest?  Met de aanschaf van een machine ben je er niet. Het gehele proces moet onder controle zijn. De techniek achter dampfasereiniging zal worden verteld door Ecoclean. Mavom (Savechem) levert de gemodificeerde alcohol voor in de machine. Wat zijn de do’s and don’ts? Hoe kom je tot een perfect gereinigd product?

Peter Buescher, Application Specialist, Olympus Nederland

Enhancing component and surface cleaning tasks across all sectors like: Electronics, Aerospace, Automotive and special for his event semiconductor industry.
We will show you how to measure partical contamination of component surface. And why it is important to detect particals.
An innovative illumination system enables the fast separation of metallic and non-matallic particles in cleanliness inspection.
The complete workflow from particle extraction to their detection, enumeration and classification is described based on industry standards.

Luigi Raspolini, Application and Product Specialist Electron Microscopy, Thermo Fisher Scientific

Particulate in the production environment poses a threat to mass production. Scanning electron microscopes (SEM) with energy dispersive spectrometers (EDS) are valuable and widely recognized tools that can effectively determine the presence of contaminants and reveal their chemical composition. The analysis - normally manually operated - is performed on every single particle, resulting in a long and tedious process with high chance of error, typically resulting in outsourcing of the analysis to a specialized and expensive center. Phenom ParticleX is an automated imaging and analysis workflow, cherry-topped by an advanced classification system that will recognize the particle material directly from its chemical composition in just half a second per particle – thus allowing for a timely intervention on the production line as soon as threats are identified.

Paul Krüsemann, Specialist contamination control, Eurofins Materials Science Netherlands

Het schadelijke effect van deeltjes op producten en productiemiddelen is al lang bekend. Daarom worden productie en assemblage in een clean room uitgevoerd. Er wordt aandacht besteed aan preventieve reiniging van basismaterialen en gereedschappen en er wordt onderzoek gedaan naar toegepaste materialen om het ontstaan van deeltjes tijdens verschillende processtappen te voorkomen. De aanwezigheid van gassen en dampen (Airborne Molecular Contamination, AMC) kan echter ook een rampzalig effect hebben op producten en machines, met soortgelijke negatieve verschijnselen, als bij deeltjesvervuiling. Om deze reden is de beheersing van chemische verontreinigingen in clean room lucht en het ontgassen van materialen cruciaal voor een succesvolle productie. Deze effecten worden reeds lange tijd onderkend in de halfgeleiderindustrie en het kost de nodige inspanning om deze potentiële bron van verontreiniging tot een minimum te beperken.

Robert Meier, Head of Cleaning Process Technology, ZEISS Semiconductor Manufacturing Technology

In the context of manufacturing complex optics for semiconductor lithography systems great importance is attached to highly specialized EUV cleaning processes including the installation of specific machinery and specialized cleanliness processes. A key function for the successful realization was ascribed to standardization of the related processes and metrology procedures throughout the complete supply chain. This presentation puts is focus on organic contamination and the presence of critical elements on atomic level and their influence on optical lifetime in the EUV systems. The jointly taken effort of ASML and CZ SMT covers the alignment of guidelines which should reach down to the n-th tier of the supply chain, over the common release of international positioned cleanliness service providers.

Elvis Bajric, Eventmanager Clean 2020, Mikrocentrum

Philip van Beek, Voorzitter, VCCN

Dirk Trienekens, Cleanliness Expert, ASML

Cleanliness is becoming ever more important for ASML. Particles as small as 30 nm can cause defects for our customers, and trace amounts of certain elements can have a devastating effect on the optics. To secure performance of our systems in terms of defectivity and optics lifetime, we must be more stringent when it comes to cleanliness. To facilitate this, a new set of cleanliness requirements for suppliers was required: the new cleanliness GSA (Generic Standard of ASML) framework. While creating these GSAs, we also focused on creating more awareness for the importance of cleanliness, a clearer document structure and reducing the amount of text. In this presentation, we will present the new GSAs and the new way of working associated with it. We also briefly zoom in on the approach for the most critical (grade 1) parts, where simply performing a cleaning action after manufacturing will not suffice anymore. In the new approach for grade 1 parts, suppliers and ASML work together to pro-actively determine and eliminate risks with respect to contamination in the production process.

Freek Molkenboer, Systems Engineer, TNO

Er zijn vele werkgebieden waar moleculaire vervuiling van een oppervlak een probleem is voor het goed functioneren van een systeem. Het is van belang om tijdens het ontwerpstadium van een product of een systeem, de oppervlaktereinheidseisen realistisch op te stellen. Dit om te voorkomen dat het product óf niet schoon genoeg is óf dat er overbodige reinigingskosten worden gemaakt. In de presentatie zal een praktijkvoorbeeld worden gebruikt om alle aspecten van schoon produceren te tonen; van het opzetten van een vervuilingsbudget tot het valideren van het eindproduct.

Christian Schelle, Cleaning specialist Switzerland, VAT Vakuumventile AG

The demand for precision cleaned semiconductor components has been growing fast in the past 5 years. Furthermore, allowed particle emission of vacuum valves had to be reduced strongly to comply with requirement of sub 10 nm and introduction of EUV technology. Due to our strong focus on the semiconductor markets VAT has invested heavily into efficient precision cleaning technology as well a vacuum particle lab, which is unique for a component supplier. VAT has realized early that to fabricate and deliver a clean part, the complete manufacturing process and supply chain has to be understood and monitored. Automation and in-line process control are key elements to deliver a continuous quality to our customers. In our presentation, we will give you insights in VAT High Purity and Zero Particle program. We will explain the importance of the selection of materials, machining and cleaning equipment, packaging, automation and process control.

RVS Finish, Ecoclean, Mavom

RVS Finish heeft gekozen voor dampfasereiniging om te voldoen aan de strenge reinheidseisen. Wat was de motivatie om met dit project te starten? Waarom hebben ze voor dampfasereiniging gekozen en wat zijn de uitdagingen geweest?  Met de aanschaf van een machine ben je er niet. Het gehele proces moet onder controle zijn. De techniek achter dampfasereiniging zal worden verteld door Ecoclean. Mavom (Savechem) levert de gemodificeerde alcohol voor in de machine. Wat zijn de do’s and don’ts? Hoe kom je tot een perfect gereinigd product?

Michael Flämmich, Vice President, , VACOM Vakkuum Komponenten & Messtechnik GmbH

VACOM operates various ultra-fine cleaning processes for in-house manufactured parts as well as for Cleaning Service parts (ex-house manufactured parts) for more than 10 years. With cleaning technologies in clean rooms ISO7 to ISO5 we serve some of the most demanding Supplier Networks (e.g. in EUV-Lithography) with precisely manufactured components and Parts Cleaning Services according to the highest cleanliness specifications.
The talk covers the process to provide ultra-fine cleaned parts from the perspective of a parts manufacturer as well as from the perspective of a Cleaning Service Provider. Some challenges and well-proven solutions will be contemplated. An outlook will be given on the new Parts Cleaning Infrastructure "Clean Fab".

Gerhard Koblenzer, Managing Director, LPW Reinigungssysteme

LPW`s High Purity Division is a desirable partner in sectors with challenging cleaning specifications in Medical, Optical, and Semiconductor Industries. LPW provides standard as well as customized solutions, optimizing customers production processes.

We are especially focused on energy efficiency, uptime, and yield improvement on tool availability and quality terms. We combine established cleaning and drying methods with new state of the art methods, and develop solutions to outperform customers process requirements. Therefore LPW is able to set the benchmark for the currently relevant undesired impurities (particulate, organic or biological).

Our hermetically sealed process chambers, which facilitates the exclusion of interfering environmental factors, are key for the above mentioned performance. Applying and combining physical factors, such as pressure, vacuum, spray technology, and flow dynamics are opening a multitude process of window, optimizing or increasing our total performance. Smart process engineering, in conjunction with the customers expertise, reflects the principal element of our continuous R&D work

In recent years, LPW has been able to demonstrate its system systems to several ASML suppliers. The LPW team was able to demonstrate its skills, particularly in the case of complex geometries, densely packed and varied goods and the highest demands on technical cleanliness.

In the presentation, LPW presents the challenge and the suitable solutions for precision cleaning directly on the boundary layer and illustrates this using suitable examples.

Hein Verschuuren, Unicorn industrial cleaning solutions

Hein Verschuuren, Managing Director, Unicorn industrial cleaning solutions

Robert Meier, Head of Cleaning Process Technology, ZEISS Semiconductor Manufacturing Technology

In the context of manufacturing complex optics for semiconductor lithography systems great importance is attached to highly specialized EUV cleaning processes including the installation of specific machinery and specialized cleanliness processes. A key function for the successful realization was ascribed to standardization of the related processes and metrology procedures throughout the complete supply chain. This presentation puts is focus on organic contamination and the presence of critical elements on atomic level and their influence on optical lifetime in the EUV systems. The jointly taken effort of ASML and CZ SMT covers the alignment of guidelines which should reach down to the n-th tier of the supply chain, over the common release of international positioned cleanliness service providers.